Presentation

Report
CORIAL LOCATION
Paris
Geneva
Lyon
Grenoble
 CORIAL is located in Grenoble area, close
to Lyon and Geneva,
 In the Heart of the French Silicon Valley,
 In the Middle of Strong Research Centers,
 Excellent Machining and Software Industry.
CORIAL
CORIAL NEW FACTORY
CORIAL COMPACT 200 Series
New compact products available :
Corial 200S
Corial 200I
Corial D250
Corial 200RL
Corial 210IL
Corial 210D
Size = 75 cm wide X 108 cm deep !
 The Corial 200 series are systems which can
be equipped either with reactive ion etching
reactors (RIE) or high density plasma reactors
(ICP). All have a wide range of working
conditions. They all allow highly uniform
processes on large areas (200 mm diameter),
 The Corial D250 series are PECVD systems
equipped with an isothermal pressurized plasma
reactor for low stress and high quality film
deposition together with high uniformity on large
areas (200 mm diameter),
 The Corial 200 series and the Corial D250
series can be equipped with load-lock with
vacuum robot for up to 200 mm wafers.
 The Corial 210D is a newly designed ICP-CVD
tool for high quality film deposition at
temperatures below 100°C.
CORIAL COMPACT 300 Series
New compact products available :
Corial 300S
Corial 300RL
Corial 300IL
Size = 75 cm wide X 140 cm deep !
 The Corial 300 series are systems which can
be equipped either with reactive ion etching
reactors (RIE) or high density plasma reactors
(ICP). All have a wide range of working
conditions. They allow highly uniform processes
on large areas (320 mm diameter),
 The Corial D350 series are PECVD systems
equipped with an isothermal pressurized plasma
reactor for low stress and high quality film
deposition together with high uniformity on large
areas (300 mm diameter),
 The Corial 300 series and the Corial D350
series can be equipped with load-lock with
vacuum robot for 21 (to 27) X 2” wafers, 7 X 4”
wafers, 2 X 6” or 300 mm wafers.
 The Corial D500 is a newly designed PECVD
tool for 104 X 2” wafers, 25 X 4” wafers or 9 X 6”
wafers.
Corial D350
Corial D350L
Corial D500
EXPORT NETWORK
UVM
(N Europe)
Evatec
(UK)
CORIAL
Turkey
USA
TBS
(CIS)
ETT
(Germany)
CORIAL (Korea)
Japan
AVBA
(Israel)
Süss China
(China)
India
APS Ltd
(South-East-Asia)
Contracts signed
To be set up
MOS Technology
(Taiwan)
DRY ETCH SOLUTIONS FOR
FAILURE ANALYSIS
SOLUTIONS FOR
PASSIVE
INTEGRATED OPTICS
- Waveguides -
SOLUTIONS FOR
ACTIVE
INTEGRATED OPTICS
- LEDs & OLEDs -
SOLUTIONS FOR
MEMS & LEDs
PECVD
ICP - CVD
CONCLUSION
The key points of CORIAL are:

Accumulated > 200 years of expertise in plasma processes,

Wide range of etching applications, including RIE and High Density
Plasmas as Microwaves, DECR and ICP,

Mastering low temperature PECVD processes (<100°C).
The key points of CORIAL equipment are:
 Reactive Ion Etching, High Density Plasmas and Low damage
etching achievable in the same process chamber,
 High reactor performance achieved by design of dedicated
shuttles according to shape, size and material to etch,
 In situ plasma cleaning with no corrosion and no memory effect.

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