Developing Thin Films Using a Vacuum Evaporation System

Report
MEMD Group – memd.cankaya.edu.tr
DEVELOPING THIN FILMS USING A
VACUUM EVAPORATION SYSTEM AND
MEASUREMENTS
Student Team:
Sedef ÇALIŞKAN
Zeynep KORKMAZ
Supervisors:
Prof. Dr. Ziya Burhanettin GÜVENÇ
Prof. Dr. Celal Zaim ÇİL
Yrd. Doç. Dr. Göknur CAMBAZ BÜKE
MEMD Group – memd.cankaya.edu.tr
Outline
• Aim of the project
• PVD System
• Methodology to be followed
MEMD Group – memd.cankaya.edu.tr
Aim
To study the electrical and optical properties of thin
films produced by using physical vapor deposition
(PVD) system.
MEMD Group – memd.cankaya.edu.tr
Thin Film Technology
• Layer of material ranging from nanometer (monolayer) to
several micrometers in thickness.
• Main applications: Electronic devices and optical coatings
1. Flexible Solar Cell
2. OLED
1. http://gotpowered.com/2011/ge-develops-thin-film-photovoltaic-panels/
2. http://pinktentacle.com/2007/05/flexible-full-color-organic-el-display/
3. http://www.sciencecodex.com/silicon_spin_transistors_heat_up_and_spins_last_longer
3. Transistor
MEMD Group – memd.cankaya.edu.tr
Deposition Technologies
• Chemical Reaction
• CVD
• Electrodepositon
• Epitaxy
• Thermal oxidation
Substrate
• Physical Reaction
• PVD
• Evaporating
• Sputtering
• Casting
Deposition source
MEMD Group – memd.cankaya.edu.tr
Why PVD?
• PVD processes are environmentally friendly
• Cost effective
• Suitable for electrical devices
• Low process temperatures (with the help of pressure)
• Lower process risk
MEMD Group – memd.cankaya.edu.tr
PVD Technology
• Sources are heated
to their melting points
• Evaporated
molecules freely
move in the chamber
• Atoms condense on
substrate
MEMD Group – memd.cankaya.edu.tr
Substrate
Parameters
Thin film
Power Supply
Process Parameters
• Current
• Time
• Pressure
Material Selection
• Substrate
• Source
MEMD Group – memd.cankaya.edu.tr
Our PVD System from VAKSİS
• High technology
company
• Designing and
manufacturing
• Vacuum system
• Vacuum component
• Vacuum coating
system
MEMD Group – memd.cankaya.edu.tr
Our PVD System from VAKSİS
1 Torr = 1 mm Hg
1 mm Hg = 133.3 Pa
http://microlab.berkeley.edu/labmanual/chap6/vacuum.pdf
MEMD Group – memd.cankaya.edu.tr
Characterization
• Electrical
• Optical
• Structural - microstructure
MEMD Group – memd.cankaya.edu.tr
Summary of the Methodology
Determination of the starting parameters of PVD
(P, T, t, substrate, target)
Deposition of the Thin Film by PVD
Electrical – Optical - Structural Characterization of
these thin films
Studying the effect of process parameters
Optimization
Simple Device Fabrication and tests
MEMD Group – memd.cankaya.edu.tr
Near Future Plan
• Material Selection
• Ordering PVD System (available in two months)
• Studying electrical and optical characterization methods
• Design of the characterization set-up
MEMD Group – memd.cankaya.edu.tr
Thank You for Listening

similar documents